To meet the rapidly growing demands to lower cost per watt in the photovoltaic industry, H.C. Starck is actively promoting planar and rotary sputtering targets for thin films PV (TFPV) energy applications.

Focusing on CIGS, a-Si (amorphous silicon) and CdTe thin films solar module manufacturers, H.C. Starck has been developing and successfully producing custom sputtering targets in molybdenum (Mo) alloys along with its other core competency materials: Tantalum (Ta), niobium (Nb) and tungsten (W).

  • Sputtering Targets for Thin Film PV
  • Rotary and Planar Targets
  • Molybdenum: CIGS and CdTe
Committed to the research and development of thin films, H.C. Starck has invested in state-of-the-art laboratories for material processing and thin films. Our facilities include a Thin Film Materials Lab equipped with sputtering tools plus the supporting equipment for testing film characteristics. Customers benefit from inhouse prototyping, modeling and analytical capabilities.

Highest Quality Sputtering Target Materials

H.C. Starck is one of the world’s largest producers of molybdenum, tungsten, tantalum and niobium metals, and fabricated products with a robust vertically integrated supply chain for supplying sputter targets for thin film coatings applications. Manufacturing facilities produce a broad range of sputtering target materials in all configurations.

  • Highest Quality Sputtering Materials
    • High Purity, Low Fe, Ni, Cr
    • Fully dense
    • Chemical and metallurgical uniformity
  • Planar Sputtering Targets
    • High purity
    • Dimensional precision and tight tolerance
  • Rotary Sputtering Targets
    • Extruded monolithic rotary target configurations
      • Highest powder densities and deposition rates
      • Extended target life and material utilization
    • Unitary sleeves for bonded rotary targets
    • Integrated manufacturing “under one roof”

Innovative Research and Development

Committed to the research and development of thin film products, H.C. Starck has a renowned research staff dedicated to advancing metals technology for refractory metal sputtering targets. To benefit customers, we continually invest and upgrade our advanced manufacturing and analytical capabilities. H.C. Starck’s evaluates planar and rotary sputtering targets in its Thin Film Materials Laboratory using thin film characterization instrumentation – complete with optical and electron microscopy. In our Material Processing laboratory, we produce evaluation targets with the assistance of a complete chemical analysis lab. Advanced material modeling and simulation capabilities support the rapid development of new products and processes at H.C. Starck.

  • Comprehensive thin film applications lab
    • Planar and rotary target deposition chambers
      • Co-Sputtering capability rapid composition optimization
      • Film resistivity testing
      • Reflectivity evaluation
      • Adhesion testing
    • Metallurgical laboratory
      • Optical microscopy
      • SEM with EDX and EBSD
      • Mechanical testing / hardness
    • Environmental chamber
      • Corrosion resistance
      • Evaluation of corrosion under electrical loading
    • Extensive analytical capabilities
      • IGA gas analysis
      • ICP
      • GDMS
  • Broad engineering and R&D staff
    • Recognized leader in refractory metal technology
    • Innovated texture control to enhance film uniformity and performance consistency
    • Hundreds of patents and technical publications
  • Materials processing laboratory
    • Powder processing
    • Rolling (Deformation)
    • Hot iso-static press
    • Thermal treatments

A key advantage is the higher relative density found in extruded rotary targets compared to Hot Isostatic Press (HIP) targets.

Our expertise in thin film characterization and ESBD analysis of textures enables H.C. Starck to optimize target microstructure.

Vertically integrated supply chain

One of the world’s largest producers of molybdenum powders, as well as tungsten and tantalum, H.C. Starck is vertically integrated with expertise in reducing, pressing and sintering these high performance materials and finishing them for market. To produce planar and rotary targets, high purity molybdenum oxide (MoO3)is reduced to metal and processed for either rolling or extrusion then finished to the customer specifications. Extruded targets from H.C. Starck offer superior sputtering performance being virtually fully dense and having extremely low oxygen levels.

H.C. Starck has production capabilities that surpass most of its competitors with its world class extrusion facilities and its 5,000 metric ton direct extrusion press. H.C. Starck can produce molybdenum rotary targets with inside diameters of 125 mm (monolithic) and 135 mm (bonded) applications in molybdenum up through the current largest rotary target requirement. Tantalum, niobium, molybdenum and other materials are also produced in planar or rotary form. Targets in lengths of 4 m (or more) can be produced per customer specification.

H.C. Starck provides competent service and knowledgeable expertise to assist and guide our customers in choosing the best solution for all refractory metal applications.