H.C. Starck offers a robust product portfolio of high performance, technology metal solutions for thin film sputtering applications. H.C. Starck’s planar and rotary molybdenum (Mo) sputtering targets are manufactured for thin film transistor (TFT) applications. H.C. Starck’s molybdenum-tungsten (MoW) planar targets are applied when forming gate and touch sensor layers for TFT- LTPS and in-cell type touch panels.

Molybdenum thin films are employed as barrier layers, electrodes, and wiring in flat panel displays (FPD) systems: televisions, monitors, computers, and mobile devices for example, smart phones, digital recording devices, GPS, and other display systems.

  • Application: Gate and Touch sensor layer
    • LTPS and in-cell type touch panel

  • LTPS and in-cell type touch panel

  • Size and Dimensions (tiled or single piece)
    • Gen 4 10 mm x 1130 mm x 1200 mm
    • Gen 6 16 mm x 200 mm x 2350 mm

Please inquire for additional sizes and dimensions.

  • Composition
    • 51 weight % W
    • 25 weight % W

  • Wet and dry etching capabilities

The H.C. Starck Advantage

H.C. Starck offers varying compositions for single piece length tiles based on customer requirements. Thin films produced from MoW targets have excellent wet and dry etching characteristics.

The evolving technology in Touch Screen Panel (TSP) applications such as flexible touch screen devices necessitates higher performance and durability. H.C. Starck’s expertise in sputtering target materials and rapid product development can offer TSP customers the capabilities for improved system performance and cost.

Development of these innovative alloys is enabled by H.C. Starck’s expertise in thin film characterization and ESBD analysis of textures. Customized alloy development utilizes the unique processing of refractory metals, including powder metallurgy processing, high temperature rolling, extrusion and rotary forging.

State-of-the-art Research Laboratories

Committed to the research and development of thin films, H.C. Starck has invested in state-of-the-art laboratories for material processing and evaluation of thin films. Our facilities include a Thin Film Materials Lab equipped with planar and rotary sputtering tools along with the supporting equipment for film characterization. Customers benefit from in-house prototyping, modeling and analytical capabilities.


Product brochures

  • Language

Product data sheet

  • Language
  • PDS number/_version
  • Pure Molybdenum Powder Metallurgy Target ST-100-1
  • en
  • PD-7040_1